A system for high precision scientific and process applications

Measures the partial pressures of residual gases with ultra high resolution and extended mass range options to 1000 AMU

The HAL 3F RC systems are designed for gas analysis in high precision scientific and process applications.

Overview

The HAL 3F RC systems are designed for gas analysis in high precision scientific and process applications.

The triple filter quadrupole minimises contamination from unwanted ions, where the pre and post RF only filters work at different selected frequency from that of the main mass filter. In combination with the longer mass filter and wider rod diameter of 9 mm, this results in increased mass resolution, ion sensitivity, stability for precision/ratio measurements and high mass transmission.

Features

  • Mass range 50, 300, 510, 1000 amu, 6mm and 9 mm molybdenum pole designs
  • Increased mass resolution, high mass transmission, and ion stability
  • Full electron energy control 0-150 eV for complementary TIMS analysis mode
  • Available with SEM or PIC detection or optional dual Faraday/SEM or Faraday/PIC models

Specifications

Mass range

50, 300, 510, or 1000 amu

Minimum detectable concentration

2 x 10-14  mbar 

Ion Source

Range of electron impact ion source types available

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and electron multiplier

Analyser mounting flange

 

6mm pole diameter Mounting flange

9mm pole diameter Mounting flange

DN-63-CF (4.5"/114mm OD Conflat type) 

DN-100-CF (6"/150mm OD Conflat type)

6mm pole diameter systems adaptor

9mm pole diameter systems adaptor

DN-35-CF (2.75”/70mm OD Conflat type)

DN-63-CF (4.5”/114mm OD Conflat type)