A Residual Gas Analyser configured for demanding UHV applications
Measures the concentration of gases and vapours in real time
The Hiden RGA for UHV are designed and configured for residual gas analysis in demanding UHV applications where critical measurements at UHV are required.
Overview
The HAL 201 RC analyser includes, as standard, gold plated versions of all ion source types. The gold plated ion source is provided to minimise source outgassing, suited for applications where total pressure is < 5 x 10-10 mbar.
Features
- EPICS is the standard instrument control software used in many light sources around the world and the Hiden HAL system is fully compatible with EPICS software drivers.
- Gold plated ion sources to minimise source outgassing
- Electron impact ioniser with twin oxide coated Iridium filament
- Dual Faraday/channeltron electron multipler detector
- Minimum detectable partial pressure of 5 x 10-14 mbar
- Maximum operating pressure of 1 x 10-4 mbar
Specifications
|
Mass range |
200 amu |
|
Minimum detectable concentration |
5 x 10-14 mbar |
|
Ion Source |
Gold plated ion source |
|
Ion Source control |
Yes |
|
Electron emission |
Software variable 1µA to 2mA |
|
Electron energy |
Software variable 0V to 150 eV |
|
Ion energy |
Software variable 0V to 10 eV |
|
Detector |
Faraday cup and electron multiplier |
|
Mounting flange |
DN-35-CF (2.75"/70mm OD Conflat type) |