Pra.Ma.

1. Plasma chamber (Ion source and post ionizer)

ECWR plasma: (HF-Excitation with single loop coil at 27 MHz and static magnetic field via two Helmholtz coils)
Low pressure Ar plasma 5 x 10-4 - 2 x 10-3 mbar
Ion energy: 100 eV - 2 keV
Ion current: up to 1 mA
Typical sputter rates: 0,5 nm/s @ 130 eV Ion energy
5 nm/s @ 1 keV Ion energy
Analyzed area: 2-14 mm
Post ionization efficiency: ~ 1 %

The HF-field is screened by a metal housing.
The Ar pressure is automatically regulated via a piezo electric valve.

2. Detection system

Ion optics: 45° sector analyzer
Detection angle: 30°
Mass spectrometer: Balzers QMG 422, differentially pumped
Mass range: 0 - 340 amu
Detector: Secondary Electron multiplier (SEM), Single Ion counting

3. Sample transfer

Automatic sample transfer facility with load lock system, gate valve and storage facility for up to 5 samples
Sample size: up to 14 mm diameter and up to 5 mm thickness

4. Vacuum system

UHV-System consisting of Plasma chamber, load lock chamber and sample transfer system, including pumps, valves and pressure measuring unit