Un analizzatore di gas residui per l'analisi di processi in vuoto
Misura la composizione dei processi in vuoto, la composizione dei gas e rileva le perdite
Il HPR-30 è un analizzatore di gas residui configurato per l'analisi di gas e vapori in vuoto e per la diagnostica del vuoto. Il sistema è interamente configurabile per applicazioni specifiche, come CVD, etching al plasma, MOCVD, controllo della purezza dei gas e della presenza di contaminanti.
Overview
The HPR-30 sampling system configuration is for fast response high sensitivity analysis of gas and vapour species in vacuum processes.It is also directly suited to analysis of high mass species and precursors used in ALD and MOCVD applications.
The HPR-30 system features a close-coupled re-entrant aperture for sampling directly within the process region, providing maximum data integrity and fast confirmation of process status. Options include the innovative Hiden 3F series triple filter quadrupole system providing enhanced abundance sensitivity, part-per-billion (ppb) detection levels and high contamination resistance, particularly suited to the analysis of aggressive gases in CVD and RIE applications.
Features
- Triple filter mass spectrometer
- Mass range options 200, 300, 500 or 1000 amu
- Enhanced abundance sensitivity
- Detection to 5 ppb
- APSI-MS soft ionisation mode
Specifications
|
Mass range |
200, 300 or 510 amu |
|
Measures vacuum process gas composition |
Yes |
|
Measures contamination and leak detection |
Yes |
|
Minimum detectable concentration |
5 PPB |
|
Sample inlet pressure (Standard) |
10-3 to 5 mbar |
|
Sample inlet pressure (Optional) |
< 10-4 mbar |
|
Fast measurement speed |
Up to 500 measurements per second |