Sistemi per l'analisi dei componenti presenti in un sistema da vuoto o derivati da un processo

Misura la concentrazione di gas e vapori in tempo reale

Tutti gli analizzatori di gas residui della Hiden sono testati per l'applicazione specifica e calibrati per fornire le più elevate prestazioni, e sono coperti da una garanzia di tre anni e da un supporto tecnico per tutta la loro vita.

Overview

The Hiden RGA Series includes three specification levels :

HALO RGA - for residual gas analysis
Suitable for vacuum fingerprint analysis, leak detection and trend analysis

3F Series RGA- triple filter mass spectrometers for analytical applications
Triple filter technology provides extended mass ranges, increased mass resolution, enhanced sensitivity and improved contamination resistance for more demanding analytical applications.

3F-PIC - pulse ion counting detection for fast event studies
Ultra-fast pulse ion counting detection provides seven decade continuous dynamic range with optimum sensitivity at UHV/XHV

Features

  • Mass range options: 50, 100, 200, 300, or 510 amu.
  • Detector options give sensitivity for high vacuum to ultra high vacuum, UHV.
  • Stability (less than ±0.5% height variation over 24 h)
  • MASsoft control via RS232, USB or multiple systems via Ethernet LAN
  • Fast access for Histogram, Trend Analysis and Analog peak displays
  • Mixed mode scanning e.g. Trend, Histogram and Analog peaks in multiple-windows
  • Simultaneous real time display of graphical and tabular trend analysis data
  • Cursor for peak height identification under mouse control
  • Real time background subtract, Automatic mass scale alignment
  • Data export facility to ASCII format and to all Windows devices
  • netMASsoft, an on board web server for RGA operation from your Web browser

Specifications

Mass range

50,100, 200, 300 or 510 amu

Minimum detectable concentration (HALO)

2X10-13 mbar

Minimum detectable concentration (3F)

2X10-14 mbar

Minimum detectable concentration (3F-PIC)

2X10-15 mbar

Ion Source

Range of electron impact ion source types available

Ion Source control

Yes

Electron emission

Software variable 1µA to 2mA

Electron energy

Software variable 0V to 150 eV

Ion energy

Software variable 0V to 10 eV

Detector

Faraday cup and electron multiplier

Mounting flange (HALO)

DN-35-CF (2.75"/70mm OD Conflat type)

Mounting flange (3F – Triple Filter)

DN-63-CF (4.5”/114mm OD Conflat type)