Sistemi per l'analisi dei componenti presenti in un sistema da vuoto o derivati da un processo
Misura la concentrazione di gas e vapori in tempo reale
Tutti gli analizzatori di gas residui della Hiden sono testati per l'applicazione specifica e calibrati per fornire le più elevate prestazioni, e sono coperti da una garanzia di tre anni e da un supporto tecnico per tutta la loro vita.
Overview
The Hiden RGA Series includes three specification levels :
HALO RGA - for residual gas analysis
Suitable for vacuum fingerprint analysis, leak detection and trend analysis
3F Series RGA- triple filter mass spectrometers for analytical applications
Triple filter technology provides extended mass ranges, increased mass resolution, enhanced sensitivity and improved contamination resistance for more demanding analytical applications.
3F-PIC - pulse ion counting detection for fast event studies
Ultra-fast pulse ion counting detection provides seven decade continuous dynamic range with optimum sensitivity at UHV/XHV
Features
- Mass range options: 50, 100, 200, 300, or 510 amu.
- Detector options give sensitivity for high vacuum to ultra high vacuum, UHV.
- Stability (less than ±0.5% height variation over 24 h)
- MASsoft control via RS232, USB or multiple systems via Ethernet LAN
- Fast access for Histogram, Trend Analysis and Analog peak displays
- Mixed mode scanning e.g. Trend, Histogram and Analog peaks in multiple-windows
- Simultaneous real time display of graphical and tabular trend analysis data
- Cursor for peak height identification under mouse control
- Real time background subtract, Automatic mass scale alignment
- Data export facility to ASCII format and to all Windows devices
- netMASsoft, an on board web server for RGA operation from your Web browser
Specifications
Mass range |
50,100, 200, 300 or 510 amu |
Minimum detectable concentration (HALO) |
2X10-13 mbar |
Minimum detectable concentration (3F) |
2X10-14 mbar |
Minimum detectable concentration (3F-PIC) |
2X10-15 mbar |
Ion Source |
Range of electron impact ion source types available |
Ion Source control |
Yes |
Electron emission |
Software variable 1µA to 2mA |
Electron energy |
Software variable 0V to 150 eV |
Ion energy |
Software variable 0V to 10 eV |
Detector |
Faraday cup and electron multiplier |
Mounting flange (HALO) |
DN-35-CF (2.75"/70mm OD Conflat type) |
Mounting flange (3F – Triple Filter) |
DN-63-CF (4.5”/114mm OD Conflat type) |