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Mini ECR Plasma Source MPS-ECR |
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Features:
- Filamentless design
The absence of a
hot filament to create the plasma, permits operation with most gases
including reactive gases such as oxygen, chlorine, nitrogen and
hydrogen.
- No microwave tuning required
Simply turn the plasma on and off.
- Unique integrated shutter and current monitor option
Allows beam density and residual current measurements to be made while the beam is shut off.
- Trivial bakeout preparation ~1minute
Remove only the microwave generator and cables (no water-jacket disassembly).
- Built in microwave generator/tuner
Eliminates the need for waveguide installation. The sophisticated
microwave tuner allows tuning to be optimized for each mode for maximum
performance.
Applications:
- Argon
Ion Beam Deposition
Ion Beam Assisted Deposition (IBAD)
- Oxygen
Oxide growth: HTc superconductors, optical coatings, dielectrics
Reactive sputtering, laser ablation
Ceramic growth, Al2O3
Oxygen cleaning
Oxidation kinetics
Post growth oxidation/low temperature: SiO2
- Nitrogen Nitriding: GaN, AlN, InN, SiN
Doping: ZnSe
Alloying: GaAlAsN
- Hydrogen
Cleaning
Growth enhancement / surfactant
- Chlorine
In-situ etching
- Methane (carbon)
SiC
Product description:
The SPECS Mini ECR plasma source is a truly UHV compatible source.
Fully bakeable, with an all-welded stainless steel vacuum envelope, and
outstanding cooling from a full length water-jacket, it is suitable for
use in vacuum levels ranging from HV to those found in the most
demanding MBE applications. Through the action of the well-known
electron cyclotron resonance (ECR) phenomenon, a high density plasma is
created by coupling a radially symmetric 2.45 GHz microwave field to
ions on the 86 mT surface of a multi-polar magnetic array. A unique
combination of features and options make this an extraordinarily
versatile plasma source.
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