Features:
- Cold cathode (Penning type) high current sputter source
- Ion current up to 50ľA
- Ion energy 0.2 - 6 keV
- Beam diameter 10mm - 20mm
- Flat beam profile
- Filamentless design
Applications:
- Suitable for reactive gases
- Sputtering of large sputter areas at high sputter rates
Product description:
The ion source IQP 10/63 is a cold
cathode ion source for rapid rough cleaning of large surface areas. It
has a very flat beam profile. The energy range is about 200 eV to
6
keV. Because of its filamentless design, no exchange of used up
filaments is needed. Thus the IQP 10/63 is an economic and at the same
time easy to handle research instrument.
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