 Features:
- High ion beam current
- Beam free of impurities
- Suitable for reactive gases, like Oxygen
- Insertion depth adaptable to requirements
- Long term stable operation
- Excellent price/performance ratio
- Available with alternatively with analog or digital power supply
Application:
Sputter cleaning of samples in UHV.
Product description:
The
IQE 11/35 is a very stable extractor type ion source operating with a
long-lifetime special Yttriumoxide coated Iridium filament. As a
compact, easy-to-handle extractor type ion source the IQE 11/35 is
suitable for reactive and non-reactive gases. The source is mounted on
a 2.75" (NW35CF) flange and is available with a digital or an analog
power supply. The IQE 11/35 generates an ion current of 10-15
ľA (Argon) with a Gaussian beam profile. The beam diameter (FWHM) and
current density depend on the source-to-sample distance. The mounting
length of the source is adaptable to individual requirements (standard
62.5 mm). The direct gas transfer in the ionization area works via a
gas line on an integrated Mini-Conflat Flange (NW16CF). Typically, the
pressure in the UHV chamber remains in the 10-5 to 10-6 hPa range during operation. The source is bakeable up to 200° C and can be cleaned by internal "degassing".
 |
Cross Section through IQE 11/35.
|
|
