Ion Source IQE 12/38 Print E-mail

Features:

  • Scanable
  • Large scan area
  • Special filament for long life time and operation with reactive gases
  • Differential pumping for low pressure applications
  • Power supply with integrated scan and deflection unit
  • Key stone correction for depth profiling at tilted angles
 

Applications:

  • Cleaning and etching (sputtering) of any surface with fine focus
  • Depth profiling in AES, XPS, SSXPS
  • Primary ion source for SIMS, SNMS, ISS
  • Scanning applications
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Product description:

The ion source IQE 12/38 is an extractor type, differentially pumped ion source producing a focused, scanable ion beam of high current density. It is a dedicated small spot source for depth profiling, ISS and SIMS.
The IQE 12/38 is mounted on a rotatable 2.75" O.D. (DN38CF) flange. It operates with a filament and ionizes the gas by electron bombardment.
At its standard flange-to-sample distance of 186 mm, which corresponds to a working distance of 23 mm, it generates a beam current up to 0.8 µA at a spot size of 125 µm.
The two lens system of the source allows easy changing of the spot size, which is continuously variable from 125 µm to 1000 µm. For a spot size of 800 µm the ion current is up to 8 µA. The corresponding current density is 1-4 mA/cm² depending on the spot size (these performance data have been proven in the field and can be considered as conservative).
 
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