Pra.Ma.

Features:

• Electron Energy: 1 - 30 keV
• Beam Current: < 0.01 - 50 µA
• Focal length: 200 mm - 1 m
• Spot size: < 80 µm
• Operating pressure: 10-11 to 10-4 mbar
• Bakeout up to 200° C

Applications:

• Thin Film Deposition
• Molecular Beam Epitaxy
• Chemical Vapour Deposition
• Sputter Deposition (may need differential pumping)
• Pulsed Laser Deposition
  
• Other coating and deposition techniques
  

Product Description:

The SPECS 30 kV RHEED (Reflection High Energy Electron Diffraction) electron gun RHD-30 is a fully UHV compatible RHEED gun bakeable to 200° C and includes all the features and options required to take advantage of this powerful analysis technique. Capable of being operated over a wide range of pressures RHEED can be used in a variety of applications (see above).

Data Acquisition Software Safire

RHEED Screens