Pra.Ma.

Surface analysis based on ultra high vacuum (UHV) is an extremely sensitive method for studying processes at the atomic scale. Various methods like XPS, UPS, SPM, LEED, AES, ISS, EELS, LEEM/PEEM and more are at hand to analyse morphological and electronic properties of both bulk and its surfaces in modern surface analysis systems.

All these techniques require a high degree of cleanliness of the sample and its environment. Impurities on the sample surface at a scale of only one part per thousand can cause considerable disturbances of the measuring results. A very effective way to prepare extremely homogeneous and clean sample surfaces or bulk materials is by creating them with Molecular Beam Epitaxy (MBE), a preparation technique based on vapour deposition in UHV. Applicable for a variety of materials it creates single crystalline films with high perfection.

In a combined MBE and Surface Analysis system, as it is available from the Network of Competence it is possible to do in-situ preparation and analysis of the sample in a step-by-step approach. Without having to break the vacuum the sample is transferred between the MBE and the analysis chamber. In the analysis chamber various scientific prospects can be investigated, like for example the growth mode, reconstruction, relaxation, crystallinity, electrical properties, morphology or the chemical composition of the surface. Of course in a customized system like this especially the properties of new materials can be investigated.

As international distributor of CreaTec SPECS offers a standard system for Organic Layer Deposition (OLED), the two-chamber MBE-system RS-2 and the three chamber MBE-system RS-3.