Pra.Ma.

Molecular Beam Epitaxy (MBE) is a method of thin-film deposition producing homogeneous "epitaxial" (greek; "epi" - above and "taxis" - in ordered manner) films of atoms on a single-crystalline substrate. The most important aspect of MBE is the slow deposition rate which allows ordered single crystalline growth on the substrate. The slow deposition rate requires ultra high vacuum in order to achieve highest purity levels. Molecular beam epitaxy has applications in nanotechnology and in the manufacturing of semiconductor and photonic devices.

SPECS GmbH internationally markets MBE-systems produced by its partner company CreaTec Fischer & Co. GmbH, Erligheim, a manufacturer of custom-built and application-oriented systems and components for UHV and MBE. With many years of experience in construction and design of UHV equipment CreaTec is known for its ability to meet even very challenging customer requirements and demands.