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Low Energy Electron Diffraction (LEED) is one of the most powerful
methods to determine surface structures. Analysis of LEED patterns and
intensities provides the size and shape of the surface unit cell, the
degree of order, and detailed atomic structure with a precision of the
order of picometers. To exploit the full power of the technique,
equally capable instrumentation is required. SPECS LEED systems
together with highly sophisticated acquisition and analysis solutions
provide the experimenter with many unique advantages present in no
other commercial unit.
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Effusion Cells
( 16 items )
Effusion cells are mainly used in thin film preparation systems based
on ultra-high vacuum (UHV) to generate extremely pure molecular or
atomic beams from a large variety of elements and compounds. Their main
fields of application are surface science and molecular beam epitaxy
(MBE). In general the vapor pressure and the reactivity of the material
determines the type of effusion cell to be used. Therefore different
cell designs have been developed according to the material system.
Effusion cells are the most crucial components in MBE-systems. The
consequent use of ultrapure materials as well as the rigorous cleaning
and outgassing of all parts are a standard during the manufacturing
process for all effusion cells available at SPECS. In addition our
effusion cells are assembled under class 10 cleanroom conditions. Leak
testing, baking at maximum temperatures with and without crucibles and
burn-in tests are all performed in a dedicated UHV environment. These
procedures guarantee successful operation providing excellent layer
quality in your MBE-system.
All effusion cells available at SPECS hold the following features:
- Versatility. Suitable for different materials and various MBE system designs
- Custom designed. Different lengths and diameters available
- Equipped with exchangeable crucibles dedicated for the material to be evaporated
- Specially adapted controller units with high-precision PID controllers and stable power supplies (AC/DC)
- Integrated shutters and water-cooling systems available
- Completely manufactured in Germany
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Thin film growth
( 6 items )
Today electronic devices govern our everyday life. There is the need
for continuous miniaturization in production and integration of micro-
and nanoelectronics, still fulfilling Moore's law. Also the production
of low cost large scale devices, like photovoltaic modules with typical
areas of one square meter per module, is a challenge for future
worldwide progression. In both fields the physical properties are
determined by materials interfaces. For large modules minimization of
materials consumption as well as electrical losses consequently leads
to the development of thin film devices, in most cases produced by
using non-epitaxial deposition methods.
Thin-film deposition covers
any technique for depositing a thin film material onto a bulk or thin
film substrate. Elemental alloy or compound films are produced by
non-reactive or reactive deposition or co-deposition. Often
functionalization or tayloring of device interfaces by predeposition or
deposition assisting surface treatment with atoms or ions is necessary.
Using synergies within the Network Of Competence
SPECS stands for experienced consultation and design of complete,
customized thin film preparation or deposition solutions for all
chemical and physical deposition applications. Integration with
state-of-the-art surface analysis techniques can easily be realized.
SPECS offers robust, highly reliable and precise single components for
thin film deposition and surface modification:
- Single (EBE-1) and multi pocket electron beam evaporator (EBE-4)
for deposition of thin metal and compound films with highest purity.
The sources can be used with rods and crucibles in every configuration
needed and upgraded with a wide variety of accessories.
- Electron Cyclotron Resonance (ECR) (PCS-ECR and MPS-ECR ) and Radio Frequency (RF) excited plasma cracker sources (PCS-RF
) for surface modification and deposition assisting surface treatment
with inert or reactive atom or ion species. The sources can be
reconfigured for new applications.
- Thermal gas cracker source (TGC-H) for pure atomic hydrogen surface treatment.
SPECS is your experienced partner for integrated thin film deposition of advanced device structures.
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MBE
( 5 items )
Molecular Beam Epitaxy (MBE) is a method of thin-film deposition
producing homogeneous "epitaxial" (greek; "epi" - above and "taxis" -
in ordered manner) films of atoms on a single-crystalline substrate.
The most important aspect of MBE is the slow deposition rate which
allows ordered single crystalline growth on the substrate. The slow
deposition rate requires ultra high vacuum in order to achieve highest
purity levels. Molecular beam epitaxy has applications in
nanotechnology and in the manufacturing of semiconductor and photonic
devices.
SPECS GmbH internationally markets MBE-systems
produced by its partner company CreaTec Fischer & Co. GmbH,
Erligheim, a manufacturer of custom-built and application-oriented
systems and components for UHV and MBE. With many years of experience
in construction and design of UHV equipment CreaTec is known for its
ability to meet even very challenging customer requirements and
demands.
Within the Network of Competence SPECS and CreaTec cooperate in manufacturing customized integrated systems combining analysis and MBE facilities.
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LEEM/PEEM
( 1 items )
FE-LEEM P90
Features:
- 5 nm resolution
- 90° magnetic deflector
- Cold Field emitter
- Rapid LEED/LEEM switching
- Fast sample exchange
Product Description:
The FE-LEEM P90 is a next generation Low Energy Electron Microscope
with unsurpassed 5 nm resolution for dynamic LEEM microscopy
experiments. With this instrument, based on the design of Dr. Rudolf
Tromp, nanometer scale processes on surfaces can be observed in
real-time.
Guiding the design of the SPECS FE-LEEM P90 was
the goal to achieve an extremely high resolution with a minimum number
of electronoptical elements.
In order to achieve this incoming and outgoing electrons are separated by a
90° magnetic prism array. This geometry allows a simple, intuitive step
by step adjustment of all lens parameters. The magnetic prism transfers
both the LEEM image and the LEED pattern astigmatically, allowing
routine switching between real image and diffraction. Both image and
LEED pattern are transferred without the negative effects of chromatic
dispersion, offering superior image and diffraction capabilities.
A sophisticated energy filter enables imaging with an energy resolution
down to 250 meV with a minimal impact on the high spatial resolution of
the instrument.
The FE-LEEM P90 is integrated into a UHV LEEM
sample analysis chamber with facilities for sample preparation and
in-situ high temperature sample processing.
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Instrumentation for Scanning Probe Microscopy (SPM)
( 2 items )
Instrumentation for Scanning Probe Microscopy (SPM)
With
Scanning Probe Microscopy (SPM) being a key technology for
nanotechnology SPECS offers dedicated solutions for highly demanding
requirements:
The highly robust STM 150 Aarhus for variable temperature STM (Scanning Tunneling Micrcoscopy) studies and the CreaTec low temperature SPM (Scanning Probe Microscopy) solutions for atomic and molecular manipulation and spectroscopy at liquid helium temperatures.
Within the Network of Competence these SPM solutions are manufactured, maintained and further developed on SPECS premises.
Versatile
solutions particularly with the need for true cantilever variable
temperature Atomic Force Microscopy (AFM) can be offered within the
strategic partnership with RHK Technologies.
With these
instruments developed in continuing collaborations with key scientists
SPECS guarentees dedicated SPM research possibilities in the field of
nanotechnology.
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Sources
( 11 items )
Excitation Sources
Easy handling, Safety and Compatibility
To
our customers in research and industry we offer a variety of sources
for deposition, excitation and charge neutralization as well as
analyzers and monochromators. Most of our sources originate from
product lines, which we have taken over from Leybold AG, Cologne, and
from VSI GmbH. The X-ray monochromator Focus 500 and the UV
monochromator TMM 300 are original developments of SPECS.
Compliance with industrial standards, a good price-performance
ratio, stability and longevity are the guidelines for our product
development. We focus on standardized easy handling, user-friendlyness,
standardised software interfaces and safety.
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Surface Analysis Systems
( 3 items )
Specialized & customized systems for Surface Analysis
SPECS
is specialized in the development and production of customized UHV
surface analysis systems. For the development and construction of these
highly customized research systems SPECS closely cooperates with
partner companies within the Network of Competence. By combining the expert knowledge of the network partners BESTEC , CreaTec and Surface Concept we offer complete solutions like Synchrotron Beamlines with
endstations, providing facilities for in-situ sample preparation (using
MBE, PLD and Sputtering techniques) and analysis by a variety of
methods, like XPS, UPS, ISS, AES, LEED, LEEM/PEEM, STM and more.
A selection of possible applications:
Moreover
SPECS offers compact solutions like the ESCA system SAGE and the SNMS
system INA-X for the control of wafer surface composition, depth
profiling of chemical concentrations and polymer surface composition
checks.
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Electron Spectrometers
( 3 items )
A New Generation Hemispherical Energy Analyzers for Electron and Ion Spectroscopy
Nanotechnology
is focused on the engineering and the physical properties of small
structures sized 1-100 nm. Techniques that have sensitivities at a
scale of 0.1 nm to 100 nm are required to study and create these small
structures. Different methods of electron spectroscopy (XPS, UPS and
AES) have a sensitivity in the range of 1-10 nm and are therefore key
techniques in nanoscience.Thanks to our high level of expertise in
electron optics and electronics we can offer electron spectrometers
with the highest resolution and transmission possible.
Two types of electron spectrometers are available at SPECS:
- The hemispherical energy analyzer PHOIBOS
- The high resolution EELS spectrometer Delta 0.5 .
New
approaches and technical solutions are the cause for the unparalleled
success story of our PHOIBOS analyzer series. Since its launch in 2004
the PHOIBOS has been sold to 150 laboratories throughout the world with
a steadily rising demand. An extensive list of scientific publications
witnesses the impressive results that researchers achieve with this
analyzer. The PHOIBOS is the leading analyzer worldwide regarding
energy resolution, transmission and versatility.
Also with
its high resolution Electron Energy Loss Spectrometer Delta 0.5,
designed by Prof. Harald Ibach, Institut für Grenzflächenforschung, KFA
Jülich, SPECS is at the forefront of technology. With its special
design the Delta 0.5 achieves an ultimate resolution of 0.5 meV.
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