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Atomic Hydrogen Source (TGC-H) |
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Effusion Cells
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Product description:
The atomic hydrogen source HCL is used
as a thermal cracker for hydrogen. Atomic hydrogen allows cleaning of
substrates like Si, GaAs, InP, etc. at low temperatures and is also
used for surfactant growth. The hydrogen gas (H2) flows
through a molybdenum tube to a hot tungsten filament which is located
at the end of this tube. It can be heated to a temperature of up to
2500° C to achieve an exellent cracking efficiency of the hydrogen gas.
By using a precision valve, hydrogen pressure can be directly adjusted.
With a mass flow controller, mounted between the hydrogen bottle and
the leak valve, the pressure control can be made extremely accurate.
Technical data:
Standard:
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Type
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HLC
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Heating system
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Radiation heating
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Temperature range
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200 C - 2500 C
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Temperature stability
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≤ 1 K depending on the PID controller
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Max. outgas temp
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2500 C
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Max. power
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280 W |
| Max. current |
25 A
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Water cooling
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integrated
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| Bakeout temperature |
250 C
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Conditioning
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Heated to maximum temperature with and without crucible
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Shipping
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Stainless steel container with valve flooded with nitrogen
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| Custom: |
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Flange size
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CF 40 / CF 63
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| Max outer diameter |
38 mm
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Length
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As specified
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Thermocouple type
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Type C / WRe 5% - 26%
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Options:
Other dimensions
Molybdenum version
Tungsten version
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