Effusion Cells

Effusion cells are mainly used in thin film preparation systems based on ultra-high vacuum (UHV) to generate extremely pure molecular or atomic beams from a large variety of elements and compounds. Their main fields of application are surface science and molecular beam epitaxy (MBE). In general the vapor pressure and the reactivity of the material determines the type of effusion cell to be used. Therefore different cell designs have been developed according to the material system.

Effusion cells are the most crucial components in MBE-systems. The consequent use of ultrapure materials as well as the rigorous cleaning and outgassing of all parts are a standard during the manufacturing process for all effusion cells available at SPECS. In addition our effusion cells are assembled under class 10 cleanroom conditions. Leak testing, baking at maximum temperatures with and without crucibles and burn-in tests are all performed in a dedicated UHV environment. These procedures guarantee successful operation providing excellent layer quality in your MBE-system.

All effusion cells available at SPECS hold the following features:

  • Versatility. Suitable for different materials and various MBE system designs
  • Custom designed. Different lengths and diameters available
  • Equipped with exchangeable crucibles dedicated for the material to be evaporated
  • Specially adapted controller units with high-precision PID controllers and stable power supplies (AC/DC)
  • Integrated shutters and water-cooling systems available
  • Completely manufactured in Germany

 

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Item Title
Power Supplies
Water Cooling Systems
Shutters
Crucibles
Standard Effusion Cell (SFC)
Molybdenum Effusion Cell
Low Temperature Effusion Cell (LTC)
High Temperature Effusion Cell (HTC)
Dual Filament Cell (DFC)
Cold Lip Effusion Cell (CLC)
Cracker Effusion Cell (CRC)
Valved Cracker Effusion Cell
Valved Effusion Cell (V-LTC)
Carbon Cell (EBC)
Atomic Hydrogen Source (TGC-H)
Near-Ambient Temperature Cell (NATC)
 
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Results 1 - 16 of 16
  • Thin film growth  ( 6 items )

    Today electronic devices govern our everyday life. There is the need for continuous miniaturization in production and integration of micro- and nanoelectronics, still fulfilling Moore's law. Also the production of low cost large scale devices, like photovoltaic modules with typical areas of one square meter per module, is a challenge for future worldwide progression. In both fields the physical properties are determined by materials interfaces. For large modules minimization of materials consumption as well as electrical losses consequently leads to the development of thin film devices, in most cases produced by using non-epitaxial deposition methods.

    Thin-film deposition covers any technique for depositing a thin film material onto a bulk or thin film substrate. Elemental alloy or compound films are produced by non-reactive or reactive deposition or co-deposition. Often functionalization or tayloring of device interfaces by predeposition or deposition assisting surface treatment with atoms or ions is necessary.

    Using synergies within the Network Of Competence SPECS stands for experienced consultation and design of complete, customized thin film preparation or deposition solutions for all chemical and physical deposition applications. Integration with state-of-the-art surface analysis techniques can easily be realized. SPECS offers robust, highly reliable and precise single components for thin film deposition and surface modification:

    • Single (EBE-1) and multi pocket electron beam evaporator (EBE-4) for deposition of thin metal and compound films with highest purity. The sources can be used with rods and crucibles in every configuration needed and upgraded with a wide variety of accessories.
    • Electron Cyclotron Resonance (ECR) (PCS-ECR and MPS-ECR ) and Radio Frequency (RF) excited plasma cracker sources (PCS-RF ) for surface modification and deposition assisting surface treatment with inert or reactive atom or ion species. The sources can be reconfigured for new applications.
    • Thermal gas cracker source (TGC-H) for pure atomic hydrogen surface treatment.
    SPECS is your experienced partner for integrated thin film deposition of advanced device structures.
  • MBE  ( 5 items )

    Molecular Beam Epitaxy (MBE) is a method of thin-film deposition producing homogeneous "epitaxial" (greek; "epi" - above and "taxis" - in ordered manner) films of atoms on a single-crystalline substrate. The most important aspect of MBE is the slow deposition rate which allows ordered single crystalline growth on the substrate. The slow deposition rate requires ultra high vacuum in order to achieve highest purity levels. Molecular beam epitaxy has applications in nanotechnology and in the manufacturing of semiconductor and photonic devices.

    SPECS GmbH internationally markets MBE-systems produced by its partner company CreaTec Fischer & Co. GmbH, Erligheim, a manufacturer of custom-built and application-oriented systems and components for UHV and MBE. With many years of experience in construction and design of UHV equipment CreaTec is known for its ability to meet even very challenging customer requirements and demands. 

    Within the Network of Competence SPECS and CreaTec cooperate in manufacturing customized integrated systems combining analysis and MBE facilities.
  • LEED  ( 2 items )
    Low Energy Electron Diffraction (LEED) is one of the most powerful methods to determine surface structures. Analysis of LEED patterns and intensities provides the size and shape of the surface unit cell, the degree of order, and detailed atomic structure with a precision of the order of picometers. To exploit the full power of the technique, equally capable instrumentation is required. SPECS LEED systems together with highly sophisticated acquisition and analysis solutions provide the experimenter with many unique advantages present in no other commercial unit.
  • LEEM/PEEM  ( 1 items )

    FE-LEEM P90

    Features:
    • 5 nm resolution
    • 90° magnetic deflector
    • Cold Field emitter
    • Rapid LEED/LEEM switching
    • Fast sample exchange
    Product Description:
    The FE-LEEM P90 is a next generation Low Energy Electron Microscope with unsurpassed 5 nm resolution for dynamic LEEM microscopy experiments. With this instrument, based on the design of Dr. Rudolf Tromp, nanometer scale processes on surfaces can be observed in real-time.

    Guiding the design of the SPECS FE-LEEM P90 was the goal to achieve an extremely high resolution with a minimum number of electronoptical elements.
    In order to achieve this incoming and outgoing electrons are separated by a
    90° magnetic prism array. This geometry allows a simple, intuitive step by step adjustment of all lens parameters. The magnetic prism transfers both the LEEM image and the LEED pattern astigmatically, allowing routine switching between real image and diffraction. Both image and LEED pattern are transferred without the negative effects of chromatic dispersion, offering superior image and diffraction capabilities.
    A sophisticated energy filter enables imaging with an energy resolution down to 250 meV with a minimal impact on the high spatial resolution of the instrument.
    The FE-LEEM P90 is integrated into a UHV LEEM sample analysis chamber with facilities for sample preparation and in-situ high temperature sample processing.

     

  • Instrumentation for Scanning Probe Microscopy (SPM)  ( 2 items )

    Instrumentation for Scanning Probe Microscopy (SPM)

    With Scanning Probe Microscopy (SPM) being a key technology for nanotechnology SPECS offers dedicated solutions for highly demanding requirements:

    The highly robust STM 150 Aarhus for variable temperature STM (Scanning Tunneling Micrcoscopy) studies and the CreaTec low temperature SPM (Scanning Probe Microscopy) solutions for atomic and molecular manipulation and spectroscopy at liquid helium temperatures.

    Within the Network of Competence these SPM solutions are manufactured, maintained and further developed on SPECS premises.

    Versatile solutions particularly with the need for true cantilever variable temperature Atomic Force Microscopy (AFM) can be offered within the strategic partnership with RHK Technologies.

    With these instruments developed in continuing collaborations with key scientists SPECS guarentees dedicated SPM research possibilities in the field of nanotechnology.

  • Sources  ( 11 items )

    Excitation Sources

    Easy handling, Safety and Compatibility

    To our customers in research and industry we offer a variety of sources for deposition, excitation and charge neutralization as well as analyzers and monochromators. Most of our sources originate from product lines, which we have taken over from Leybold AG, Cologne, and from VSI GmbH. The X-ray monochromator Focus 500 and the UV monochromator TMM 300 are original developments of SPECS.

    Compliance with industrial standards, a good price-performance ratio, stability and longevity are the guidelines for our product development. We focus on standardized easy handling, user-friendlyness, standardised software interfaces and safety.


  • Surface Analysis Systems  ( 3 items )

    Specialized & customized systems for Surface Analysis

    SPECS is specialized in the development and production of customized UHV surface analysis systems. For the development and construction of these highly customized research systems SPECS closely cooperates with partner companies within the Network of Competence. By combining the expert knowledge of the network partners BESTEC , CreaTec and Surface Concept we offer complete solutions like Synchrotron Beamlines with endstations, providing facilities for in-situ sample preparation (using MBE, PLD and Sputtering techniques) and analysis by a variety of methods, like XPS, UPS, ISS, AES, LEED, LEEM/PEEM, STM and more.

    A selection of possible applications:

    • Creation of epitaxial thin films
    • OLED
    • Analysis of electronic structures
    • Electronic band mapping
    • Surface mapping with atomic resolution
    • Atomic growth and catalytic processes on surfaces at different temperatures
    • Analysis of the atomic structure of surfaces
    • In-situ studies of surface dynamical processes, growth and structures 
    Moreover SPECS offers compact solutions like the ESCA system SAGE and the SNMS system INA-X for the control of wafer surface composition, depth profiling of chemical concentrations and polymer surface composition checks.
  • Electron Spectrometers  ( 3 items )

    A New Generation Hemispherical Energy Analyzers for Electron and Ion Spectroscopy

    Nanotechnology is focused on the engineering and the physical properties of small structures sized 1-100 nm. Techniques that have sensitivities at a scale of 0.1 nm to 100 nm are required to study and create these small structures. Different methods of electron spectroscopy (XPS, UPS and AES) have a sensitivity in the range of 1-10 nm and are therefore key techniques in nanoscience.Thanks to our high level of expertise in electron optics and electronics we can offer electron spectrometers with the highest resolution and transmission possible.

    Two types of electron spectrometers are available at SPECS:

    • The hemispherical energy analyzer PHOIBOS
    • The high resolution EELS spectrometer Delta 0.5 .

    New approaches and technical solutions are the cause for the unparalleled success story of our PHOIBOS analyzer series. Since its launch in 2004 the PHOIBOS has been sold to 150 laboratories throughout the world with a steadily rising demand. An extensive list of scientific publications witnesses the impressive results that researchers achieve with this analyzer. The PHOIBOS is the leading analyzer worldwide regarding energy resolution, transmission and versatility.

    Also with its high resolution Electron Energy Loss Spectrometer Delta 0.5, designed by Prof. Harald Ibach, Institut für Grenzflächenforschung, KFA Jülich, SPECS is at the forefront of technology. With its special design the Delta 0.5 achieves an ultimate resolution of 0.5 meV.

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